AZO thin films A Multilayers Scanning electron microscopy Bipolar resistive switching BRS Chemical and biological sensors PECVD V2O3 Carbon Nanotube CHLORINE PLASMAS Plasma etching Biofilms microbiens Functionalization Alzheimer's disease Biocapteurs Magnetron sputtering SF 6 Adsorption Spectroscopic ellipsometry Carbon nanotubes Mott insulator Non-volatile memory Thin film B Chemical synthesis Nanotubes Thin films Aluminium nitride Structure Transfert d'énergie Capacitance Plasmas froids Bixbyite XPS Films CNTs’ collapse B1 Inorganic compounds Amorphous Chemical detection A Thin films Physical vapor deposition Selenization Carbon nitride Chalcogenides A1 Characterization A-CNx Avalanche breakdown AuCu alloy TEM TiO2 Alloying Sol-gel CH4 Band gap Atomic force microscopy Etching C Photoelectron spectroscopy X-ray photoelectron spectroscopy B2 Quaternary Optical properties Calcined clay CIGSe Nanocomposite Atomic layer etching Carbon Amyloid precursor Aryl-diazonium salts B3 Solar cells Sputtering CaTiO3Pr^3^+ NEXAFS Ablation laser X-ray diffraction B2 Semiconducting indium compounds Chalcogenide glass BOMBARDMENT Vanadium Sesquioxide 3 nm in size Anatase Low-pressure plasma processing Biomasse Mott insulators Titanium dioxide Copper B2 Semiconducting alloys Semiconductors Cathepsin Residual stress Buffer Couple Kirkendall effect Ambipolar material Colloidal solution A Chalcogenides Transmission electron microscopy Band alignment Oxides Applications industrielles Chalcogenide Resistive switching Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation AlN A3 Physical vapor deposition processes